MIT MRSEC - Materials Reseach Science and Engineering Center

X-ray Diffraction Shared Experimental Facility

Bruker D8 High-Resolution XRD

Instrument Status

This instrument is currently fully functional. If you would like to be trained in its use, please contact facility staff.

Instrument Description

The Bruker D8 High-Resolution XRD (HRXRD) is best suited for analysis of highly epitaxial films such as those used in the semiconductor industry. This system uses a conventional 1.6kW sealed tube copper anode, and the X-rays are reflected off a Gobel mirror to produce a parallel beam.

The term High-Resolution X-Ray Diffraction (HRXRD) applies to the analysis of epitaxial thin films or single crystals using a double-axis or triple-axis diffractometer. HRXRD is used to determine the thickness, relaxation, composition, and defect density of epitaxial thin films. This instrument is not suitable for high-quality data collection from a powder or polycrystalline sample.

This instrument features a four-bounce Ge(022) incident beam monochromator. This optic produces highly monochromatic X-rays, eliminating all incident wavelengths except Cu Kα1 (λ=1.540562 Å). The result is very high resolution at the cost of intensity. This makes the instrument an excellent choice for epitaxial films on single crystal substrates, but a poor choice for nearly everything else.

The goniometer is a chi-cradle type, with full phi axis rotation and x-y-z translation. Including omega, this gives six positioning axes for the sample (not including the detector axis, 2Theta).

Two detectors are mounted on this instrument: a point detector, which offers higher resolution at the cost of speed, and a faster but lower-resolution linear position-sensitive detector.

There is a Anton Paar DHS 900 heating stage available. It is equipped with a PEEK dome and air cooling to reach temperatures from room temperature to 900º C.

Popular applications include:

Bruker D8 HRXRD

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